In extracted human incisors, stored in 0.5% chloramine-T solution, eight Class V cavities per group were prepared and filled with Tokuyama EE-Bond after phosphoric-acid etching the enamel portions of the cavity for 5 s in combination with Estelite Sigma Quick with an incremental technique. As a comparison the adhesive systems Scotchbond Universal Adhesive, Prime&Bond NT and Syntac Classic were used all in combination with Estelite Sigma Quick. After finishing and polishing the samples were stored in water for 21 days. Replicas were taken before and after thermocycling (2.000 cycles between 5 and 55 °C). For the assessment of the marginal adaptation quantitative margin analysis in the SEM was performed at a magnification of 200X using four defined criteria. The evaluation of the marginal adaptation after thermocycling (TC) showed very high amounts of margin quality “continuous margin” in enamel for all test groups (median and mean values 97 to 100%). The statistical evaluation revealed no statistically significant differences (p>0.05) in the results in enamel neither before nor after TC. The evaluation in dentin after TC showed statistically significant less amounts of margin quality 1 (MQ1 = “continuous margin”) in the group using Syntac Classic (median/mean: 85/87% MQ1) in comparison to all other three other tested adhesive systems with median and mean values between 93 and 100 % MQ1. After TC, the marginal adaptation at samples using Tokuyama EE-Bond showed no statistically significant differences in comparison to the other three tested products.
From this in-vitro study it can be concluded that the tested self-etching adhesive Tokuyama EE-Bond applied in combination with the selective enamel etching technique with phosphoric acid is effective in the marginal adaptation in enamel and dentin of standardized Class V restorations.
Dott. U. BLUNCK
Berlin, July, 23rd 2012
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